Sapphire Substrate is a kind of extremely hard semiconductor substrates, Kona engineering developed Sphere Substrate Polishing Slurry, including colloidal silica and alumina slurry.
In most cases, diamond abrasives is used for sapphire grading. However, which leaves scratches and other strains on the sapphire surface. So sapphire substrates need to be polished use colloidal silica or alumina slurry.
Kona Sapphire Colloidal Silica especially developed for Sapphire, with increased abrasive particle size, which can improve the removal rate as well as no compromise with high quality surface.
Our aluminium rough and final polishing slurry developed for C- Plane Sapphire, with a fast removal rate and controlled surface finish.
Sapphire substrate is currently the mainstream substrate used for UV LED. Common size of sapphire substrates are 2", 4" and 6". Sapphire substrate has the characteristics of good light transmittance, high temperature resistance, corrosion resistance and high commercialization maturity.
Kona developed silica colloidal for sapphire substrate final polishing, also provides alumina slurry for sapphire substrate rough and final polishing.
|Silica colloidal for sapphire
|C-plane sapphire polishing slurry