Kona Nano Colloidal Silica provides a super-smooth surface for polishing special materials, such as Metallograpic samples, Niobate (LiNbO3) and Silicon Wafer.
Kona Colloidal Silica can be used efficiently for polishing Optical materials infrared crystals and other special materials, while getting a good surface finish with no compromise with the polish removal rate.
Niobate (LiNbO3) for electronic substrate, Metallograpic Samples, for example Coal Rock Metallograpic, all need to be polished to get a highly reflective quality surface, Kon Colloidal Silica provides a damage-free way.
Kona have the ability to develop different kind of polishing slurry based on different abrasives, and we can customize the abrasive size and concentration according to customers' needs.