Changsha Kona Fine Chemical Co., Ltd.

Three Main Types of Sapphire Polishing Slurry

Kona is a professional provider in the polishing abrasive industry, 

we focus on researching and developing various polishing abrasive which including sapphire polishing slurry and powders.

Sapphire, known for its high hardness and low chemical reactivity,

 has traditionally posed challenges in achieving optimal polishing rates. 

However, We has successfully developed an innovative approach to address this issue.

Sapphire material generally exhibits crystal orientation in the C-phase , 

which contributes to its unique properties. 

However, this orientation also results in a relatively slow polishing rate compared to other materials.

 Further research  has revealed that the polishing rates of A-axis, M-axis, 

and R-axis sapphires are even slower when compared to C-axis sapphire.

In the sapphire polishing industry, many companies still rely on nano silica colloidal as the primary polishing slurry.

While this approach has yielded satisfactory results, the resulting surface roughness,

 measured by atomic force microscopy as Ra, typically remains below 0.3nm. 

The reaction between the silica colloidal and the sapphire surface can be represented by the following equation,

 leading to the formation of hydrated aluminum silicate:

Al2O3 + 2SiO2 + 2H2O = Al2Si2O7·2H2O

Recognizing the need for improved polishing efficiency, 

our RD has dedicated its efforts to developing a cutting-edge solution.

Our team of experts has been tirelessly working to overcome the challenges associated with sapphire polishing. 

We understand the importance of achieving fine polishing rates while maintaining good surface quality. 

Our innovative approach aims to address these requirements, providing our clients with better results.

We offer silica colloidal with particle sizes in the range of tens of nanometers for sapphire,

 which provide excellent surface results. 

Additionally, we can provide silica sol with larger particle sizes of over a hundred nanometers to balance efficiency and surface quality. Furthermore, we also offer alumina polishing powder and slurry, which are primarily used for substrate polishing, achieving relatively good surface results with higher efficiency.